行業新聞-深圳市同泰化學技術有限公司 電鍍中間體/水性樹脂與助劑/特種水性油墨/水性納米二氧化矽/工業清洗/半導體化學品
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新材料科(ke)技與化學技(ji)術創新
圖片名稱

Dow Electronic Materials Introduces New Metallization and Imaging Products for Printed Circuit Boards

Unique Technology Helps Create Smaller, More Sustainable, Less Expensive Consumer Electronics.

發布(bu)時間:

2025-12-13

圖片名(míng)稱

Copper Gleam™ HV-101 & HV-606 Electrolytic Copper

Copper Gleam™ HV-101 and HV-606 electrolytic coppers are the latest offerings for panel plating in Vertical-in-Line equipment. They deliver high plating efficiency to improve productivity and reduce cost.

發布時間:

2025-12-13

Copper Gleam™ HS-200 Electrolytic Copper from Dupont Dow Rhom Hass Company

The Copper Gleam™ HS-200 bath is a full bright acid copper plating process specifically formulated for use in conveyorized plating equipment with insoluble anode. Formulated for high current density plating, the process is capable of producing uniform, bright deposits of high ductility and tensile strength in accelerated plating times.

發布時(shi)間:

Circuposit™ 3000-1 from Dupont Dow Rhom Hass Company

Circuposit™ 3000-1 Electroless Copper is a unique, patented process that is widely used by leading PCB fabricators throughout the world. This novel self-accelerating electroless copper eliminates the need for a separate accelerator step, saving space and improving quality and control. The 3350-1 electroless copper bath is formulated to provide improved physical properties and produce exceptionally fine-grain, low-stress deposits, which yield enhanced hole-wall coverage and excellent adhesion even on the most demanding high-performance substrates.

發(fā)布時間:

2025-12-13

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